The influence of substrate temperature on growth of para-sexiphenyl thin films on Ir{111} supported graphene studied by LEEM

Fawad S. Khokar, Gregor Hlawacek, Raoul van Gastel, Harold J. W. Zandvliet, Christian Teichert, Bene Poelsema

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Translated title of the contribution	The influence of substrate temperature on growth of para-sexiphenyl thin films on Ir{111} supported graphene studied by LEEM
Original language	English
Pages (from-to)	475-480
Journal	Surface Science
Volume	606
DOIs	https://doi.org/10.1016/j.susc.2011.11.012
Publication status	Published - 2012

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title = "The influence of substrate temperature on growth of para-sexiphenyl thin films on Ir{111} supported graphene studied by LEEM",

author = "Khokar, {Fawad S.} and Gregor Hlawacek and {van Gastel}, Raoul and Zandvliet, {Harold J. W.} and Christian Teichert and Bene Poelsema",

year = "2012",

doi = "10.1016/j.susc.2011.11.012",

language = "English",

volume = "606",

pages = "475--480",

journal = "Surface Science",

issn = "0043-2539",

publisher = "Elsevier",

}

TY - JOUR

T1 - The influence of substrate temperature on growth of para-sexiphenyl thin films on Ir{111} supported graphene studied by LEEM

AU - Khokar, Fawad S.

AU - Hlawacek, Gregor

AU - van Gastel, Raoul

AU - Zandvliet, Harold J. W.

AU - Teichert, Christian

AU - Poelsema, Bene

PY - 2012

Y1 - 2012

U2 - 10.1016/j.susc.2011.11.012

DO - 10.1016/j.susc.2011.11.012

M3 - Article

SN - 0043-2539

VL - 606

SP - 475

EP - 480

JO - Surface Science

JF - Surface Science

ER -