Structure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit

Jörg Paulitsch, M. Schenkel, Th. Zufraß, Paul Heinz Mayrhofer, W.-D. Münz

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Translated title of the contributionStructure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit
Original languageEnglish
Pages (from-to)5558-5564
JournalThin solid films
Volume518
DOIs
Publication statusPublished - 2010

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