Photonic superlattice multilayers for EUV lithography infrastructure

F. Kuchar; R. Meisels

doi:10.1117/12.2322410

Photonic superlattice multilayers for EUV lithography infrastructure

Chair of Physics (460)

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English
Title of host publication	34th European Mask and Lithography Conference
Publisher	SPIE
Volume	10775
ISBN (Print)	9781510621213
DOIs	https://doi.org/10.1117/12.2322410
Publication status	Published - 1 Jan 2018
Event	34th European Mask and Lithography Conference, EMLC 2018 - Grenoble, France Duration: 18 Jun 2018 → 20 Jun 2018

Conference

Conference	34th European Mask and Lithography Conference, EMLC 2018
Country/Territory	France
City	Grenoble
Period	18/06/18 → 20/06/18

Keywords

Bragg reflectors
Extreme ultraviolet
Photonic crystals
Superlattices

Access to Document

10.1117/12.2322410

Cite this

@inproceedings{cd33f84fe6e04572a672effe5f444b5a,

title = "Photonic superlattice multilayers for EUV lithography infrastructure",

keywords = "Bragg reflectors, Extreme ultraviolet, Photonic crystals, Superlattices",

author = "F. Kuchar and R. Meisels",

year = "2018",

month = jan,

day = "1",

doi = "10.1117/12.2322410",

language = "English",

isbn = "9781510621213",

volume = "10775",

booktitle = "34th European Mask and Lithography Conference",

publisher = "SPIE",

address = "United States",

note = "34th European Mask and Lithography Conference, EMLC 2018 ; Conference date: 18-06-2018 Through 20-06-2018",

}

TY - GEN

T1 - Photonic superlattice multilayers for EUV lithography infrastructure

AU - Kuchar, F.

AU - Meisels, R.

PY - 2018/1/1

Y1 - 2018/1/1

KW - Bragg reflectors

KW - Extreme ultraviolet

KW - Photonic crystals

KW - Superlattices

UR - http://www.scopus.com/inward/record.url?scp=85054677555&partnerID=8YFLogxK

U2 - 10.1117/12.2322410

DO - 10.1117/12.2322410

M3 - Conference contribution

AN - SCOPUS:85054677555

SN - 9781510621213

VL - 10775

BT - 34th European Mask and Lithography Conference

PB - SPIE

T2 - 34th European Mask and Lithography Conference, EMLC 2018

Y2 - 18 June 2018 through 20 June 2018

ER -

Photonic superlattice multilayers for EUV lithography infrastructure

Conference

Keywords

Access to Document

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Cite this