Photolithographic Patterning of Polymer Surfaces Using the Photo-Freis Rearrangement: Selective Postexposure Reactions

Thomas Grießer, T. Höfler, S. Temmel, Wolfgang Kern, G. Trimmel

Research output: Contribution to journal › Article › Research › peer-review

22 Citations (Scopus)

Translated title of the contribution	Photolithographic Patterning of Polymer Surfaces Using the Photo-Freis Rearrangement: Selective Postexposure Reactions
Original language	English
Pages (from-to)	3011-3016
Journal	Chemistry of materials
Volume	19
Publication status	Published - 2008

Cite this

@article{50dc1d6a5e7c41fe912de9c8d4ade193,

title = "Photolithographic Patterning of Polymer Surfaces Using the Photo-Freis Rearrangement: Selective Postexposure Reactions",

author = "Thomas Grie{\ss}er and T. H{\"o}fler and S. Temmel and Wolfgang Kern and G. Trimmel",

year = "2008",

language = "English",

volume = "19",

pages = "3011--3016",

journal = "Chemistry of materials",

issn = "0897-4756",

publisher = "American Chemical Society",

}