Oxidation and wet etching behavior of sputtered Mo-Ti-Al films

Tanja Jörg, Anna Maria Hofer-Roblyek, Harald Köstenbauer, Jörg Winkler, Christian Mitterer

Research output: Contribution to journal › Article › Research › peer-review

4 Citations (Scopus)

Original language	English
Pages (from-to)	021513-1-021513-5
Journal	Journal of vacuum science & technology / A (JVST)
Volume	36
DOIs	https://doi.org/10.1116/1.5009289
Publication status	Published - 2018

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title = "Oxidation and wet etching behavior of sputtered Mo-Ti-Al films",

author = "Tanja J{\"o}rg and Hofer-Roblyek, {Anna Maria} and Harald K{\"o}stenbauer and J{\"o}rg Winkler and Christian Mitterer",

year = "2018",

doi = "10.1116/1.5009289",

language = "English",

volume = "36",

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journal = "Journal of vacuum science & technology / A (JVST)",

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publisher = "AVS Science and Technology Society",

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TY - JOUR

T1 - Oxidation and wet etching behavior of sputtered Mo-Ti-Al films

AU - Jörg, Tanja

AU - Hofer-Roblyek, Anna Maria

AU - Köstenbauer, Harald

AU - Winkler, Jörg

AU - Mitterer, Christian

PY - 2018

Y1 - 2018

U2 - 10.1116/1.5009289

DO - 10.1116/1.5009289

M3 - Article

SN - 0734-2101

VL - 36

SP - 021513-1-021513-5

JO - Journal of vacuum science & technology / A (JVST)

JF - Journal of vacuum science & technology / A (JVST)

ER -