New photosensitive silane molecule for photochemical patterning of thin layers

Alexandra Lex, Peter Pacher, Robert Schennach, Quan Shen, Gregor Hlawacek, Christian Teichert, Oliver Werzer, Roland Resel, Egbert Zojer, Wolfgang Kern, Georg Trimmel

Research output: Contribution to conferencePosterResearchpeer-review

Translated title of the contributionNew photosensitive silane molecule for photochemical patterning of thin layers
Original languageEnglish
Publication statusPublished - 2007
EventNFN Winter School on Organic Electronics 2008 Planneralm - Planneralm, Donnersbach, Austria
Duration: 26 Jan 200831 Jan 2008

Conference

ConferenceNFN Winter School on Organic Electronics 2008 Planneralm
Country/TerritoryAustria
CityDonnersbach
Period26/01/0831/01/08

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