Influence of bipolar pulsed DC magnetron sputtering on elemental composition and micro-structure of Ti-Al-Y-N thin films

Martin Moser, Paul Heinz Mayrhofer, L Székely, G Sáfrán, P.B. Barna

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Translated title of the contribution	Influence of bipolar pulsed DC magnetron sputtering on elemental composition and micro-structure of Ti-Al-Y-N thin films
Original language	English
Pages (from-to)	148-155
Journal	Surface & coatings technology
Volume	203
Publication status	Published - 2008

Cite this

@article{0ecf1d361d31490ca226acca5daa7e17,

title = "Influence of bipolar pulsed DC magnetron sputtering on elemental composition and micro-structure of Ti-Al-Y-N thin films",

author = "Martin Moser and Mayrhofer, {Paul Heinz} and L Sz{\'e}kely and G S{\'a}fr{\'a}n and P.B. Barna",

year = "2008",

language = "English",

volume = "203",

pages = "148--155",

journal = "Surface & coatings technology",

issn = "0257-8972",

publisher = "Elsevier",

}

TY - JOUR

T1 - Influence of bipolar pulsed DC magnetron sputtering on elemental composition and micro-structure of Ti-Al-Y-N thin films

AU - Moser, Martin

AU - Mayrhofer, Paul Heinz

AU - Székely, L

AU - Sáfrán, G

AU - Barna, P.B.

PY - 2008

Y1 - 2008

M3 - Article

SN - 0257-8972

VL - 203

SP - 148

EP - 155

JO - Surface & coatings technology

JF - Surface & coatings technology

ER -