Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO2(110) Surfaces

Dominik Wrana; Markus Kratzer; Konrad Szajna; Marek Nikiel; Benedykt R. Jany; Marcin Korzekwa; Christian Teichert; Franciszek Krok

doi:10.1021/acs.jpcc.5b04384

Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO2(110) Surfaces

Dominik Wrana, Markus Kratzer, Konrad Szajna, Marek Nikiel, Benedykt R. Jany, Marcin Korzekwa, Christian Teichert, Franciszek Krok

Chair of Physics (460)

Research output: Contribution to journal › Article › Research › peer-review

17 Citations (Scopus)

Original language	English
Pages (from-to)	17004-17015
Journal	Journal of physical chemistry C (C, Nanomaterials and interfaces)
Volume	119
Issue number	29
DOIs	https://doi.org/10.1021/acs.jpcc.5b04384
Publication status	Published - 23 Jul 2015

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10.1021/acs.jpcc.5b04384

Cite this

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title = "Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO2(110) Surfaces",

author = "Dominik Wrana and Markus Kratzer and Konrad Szajna and Marek Nikiel and Jany, {Benedykt R.} and Marcin Korzekwa and Christian Teichert and Franciszek Krok",

year = "2015",

month = jul,

day = "23",

doi = "10.1021/acs.jpcc.5b04384",

language = "English",

volume = "119",

pages = "17004--17015",

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TY - JOUR

T1 - Growth of para-Hexaphenyl Thin Films on Flat, Atomically Clean versus Air-Passivated TiO2(110) Surfaces

AU - Wrana, Dominik

AU - Kratzer, Markus

AU - Szajna, Konrad

AU - Nikiel, Marek

AU - Jany, Benedykt R.

AU - Korzekwa, Marcin

AU - Teichert, Christian

AU - Krok, Franciszek

PY - 2015/7/23

Y1 - 2015/7/23

U2 - 10.1021/acs.jpcc.5b04384

DO - 10.1021/acs.jpcc.5b04384

M3 - Article

SN - 1932-7447

VL - 119

SP - 17004

EP - 17015

JO - Journal of physical chemistry C (C, Nanomaterials and interfaces)

JF - Journal of physical chemistry C (C, Nanomaterials and interfaces)

IS - 29

ER -