Evolution of the microstructure of sputter deposited TaAlON thin films with increasing oxygen partial pressure

Nina Schalk, Christian Saringer, Alexander Fian, Velislava Terziyska, J. Julin, Michael Tkadletz

Research output: Contribution to journalArticleResearchpeer-review

Original languageEnglish
Pages (from-to)1-7
JournalSurface & coatings technology
Volume2021
Issue number418
DOIs
Publication statusPublished - 2021

Cite this