Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films

Richard Rachbauer, David Holec, Martina Lattemann, Lars Hultman, Paul Heinz Mayrhofer

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Translated title of the contribution	Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films
Original language	English
Pages (from-to)	735-742
Journal	International journal of materials research : IJMR ; Zeitschrift für Metallkunde
Volume	102
Publication status	Published - 2011

Cite this

@article{9f3f4b16914b4ff995cebb182c8dcc62,

title = "Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films",

author = "Richard Rachbauer and David Holec and Martina Lattemann and Lars Hultman and Mayrhofer, {Paul Heinz}",

year = "2011",

language = "English",

volume = "102",

pages = "735--742",

journal = "International journal of materials research : IJMR ; Zeitschrift f{\"u}r Metallkunde",

issn = "1862-5282",

publisher = "Carl Hanser Verlag GmbH & Co. KG",

}

TY - JOUR

T1 - Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films

AU - Rachbauer, Richard

AU - Holec, David

AU - Lattemann, Martina

AU - Hultman, Lars

AU - Mayrhofer, Paul Heinz

PY - 2011

Y1 - 2011

M3 - Article

SN - 1862-5282

VL - 102

SP - 735

EP - 742

JO - International journal of materials research : IJMR ; Zeitschrift für Metallkunde

JF - International journal of materials research : IJMR ; Zeitschrift für Metallkunde

ER -