Chemical sensitivity on patterned organic thin films by FFM

Quan Shen, Gregor Hlawacek, Christian Teichert, Alexandra Lex, Georg Trimmel, Wolfgang Kern

Research output: Contribution to conferencePosterResearchpeer-review

Translated title of the contributionChemical sensitivity on patterned organic thin films by FFM
Original languageEnglish
Publication statusPublished - 2008
EventE-MRS 2008 Spring Meeting - Strasbourg, France
Duration: 26 May 200830 May 2008

Conference

ConferenceE-MRS 2008 Spring Meeting
CityStrasbourg, France
Period26/05/0830/05/08

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