Angular-dependent deposition of MoNbTaVW HEA thin films by three different physical vapor deposition methods

Ao Xia, Allessandro Togni, Sabrina Hirn, Giovanni Bolelli, Luca Lusvarghi, Robert Franz

Research output: Contribution to journalArticleResearchpeer-review

8 Citations (Scopus)


Within this work, MoNbTaVW high entropy alloy thin films were synthesized by dc magnetron sputter deposition, high power impulse magnetron sputtering and cathodic arc deposition to study the influence of the growth conditions on structure and properties of the films. For deposition angles ranging from 0 to 90°, the deposition rate, chemical composition, morphology and crystal structure as well as the mechanical properties were analyzed. All films showed the formation of a solid solution with body centered cubic structure regardless of deposition angle and method, whereas higher energetic growth conditions were beneficial for improved mechanical properties.

Original languageEnglish
Article number125356
Number of pages8
JournalSurface & coatings technology
Issue numberMarch
Publication statusE-pub ahead of print - 17 Jan 2020

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