UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.

Thomas Höfler; B. Basnar; J. Cirac; Thomas Grießer; Gregor Hlawacek; Helmuth Hoffmann; Quan Shen; J. Kovac; Michael Ramsey; A. Satka; Christian Teichert; Susanne Temmel; Anna Track; Gregor Trimmel; Egbert Zojer; Wolfgang Kern

UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.

Thomas Höfler, B. Basnar, J. Cirac, Thomas Grießer, Gregor Hlawacek, Helmuth Hoffmann, Quan Shen, J. Kovac, Michael Ramsey, A. Satka, Christian Teichert, Susanne Temmel, Anna Track, Gregor Trimmel, Egbert Zojer, Wolfgang Kern

Lehrstuhl für Chemie der Kunststoffe (231)

Publikation: Konferenzbeitrag › Poster › Forschung › Begutachtung

Titel in Übersetzung	UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.
Originalsprache	Deutsch
Publikationsstatus	Veröffentlicht - 2007
Veranstaltung	Materials Research Society Fall Meeting 2007 - Boston, USA / Vereinigte Staaten Dauer: 26 Nov. 2007 → 30 Nov. 2007

Konferenz

Konferenz	Materials Research Society Fall Meeting 2007
Land/Gebiet	USA / Vereinigte Staaten
Ort	Boston
Zeitraum	26/11/07 → 30/11/07

Dieses zitieren

Höfler, T., Basnar, B., Cirac, J., Grießer, T., Hlawacek, G., Hoffmann, H., Shen, Q., Kovac, J., Ramsey, M., Satka, A., Teichert, C., Temmel, S., Track, A., Trimmel, G., Zojer, E., & Kern, W. (2007). UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.. Postersitzung präsentiert bei Materials Research Society Fall Meeting 2007, Boston, Massachusetts, USA / Vereinigte Staaten.

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title = "UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.",

author = "Thomas H{\"o}fler and B. Basnar and J. Cirac and Thomas Grie{\ss}er and Gregor Hlawacek and Helmuth Hoffmann and Quan Shen and J. Kovac and Michael Ramsey and A. Satka and Christian Teichert and Susanne Temmel and Anna Track and Gregor Trimmel and Egbert Zojer and Wolfgang Kern",

year = "2007",

language = "Deutsch",

note = "Materials Research Society Fall Meeting 2007 ; Conference date: 26-11-2007 Through 30-11-2007",

}

Höfler, T, Basnar, B, Cirac, J, Grießer, T, Hlawacek, G, Hoffmann, H, Shen, Q, Kovac, J, Ramsey, M, Satka, A, Teichert, C, Temmel, S, Track, A, Trimmel, G, Zojer, E & Kern, W 2007, 'UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.', Materials Research Society Fall Meeting 2007, Boston, USA / Vereinigte Staaten, 26/11/07 - 30/11/07.

UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment. / Höfler, Thomas; Basnar, B.; Cirac, J. et al.
2007. Postersitzung präsentiert bei Materials Research Society Fall Meeting 2007, Boston, Massachusetts, USA / Vereinigte Staaten.

Publikation: Konferenzbeitrag › Poster › Forschung › Begutachtung

TY - CONF

T1 - UV-reactive Monolayers of Aryl Esters on Oxidic Surfaces: Patterning and Chemical Surface Modification via Photo-Fries Rearrangment.

AU - Höfler, Thomas

AU - Basnar, B.

AU - Cirac, J.

AU - Grießer, Thomas

AU - Hlawacek, Gregor

AU - Hoffmann, Helmuth

AU - Shen, Quan

AU - Kovac, J.

AU - Ramsey, Michael

AU - Satka, A.

AU - Teichert, Christian

AU - Temmel, Susanne

AU - Track, Anna

AU - Trimmel, Gregor

AU - Zojer, Egbert

AU - Kern, Wolfgang

PY - 2007

Y1 - 2007

M3 - Poster

T2 - Materials Research Society Fall Meeting 2007

Y2 - 26 November 2007 through 30 November 2007

ER -