Unravelling local environments in mixed TiO2–SiO2 thin films by XPS and ab initio calculations

Pavel Ondračka; David  Necas; Michèle Carette; Stephane Elisabeth; David Holec; Agnès Granier; Antoine Goullet; Lenka Zajickkova; Mireille Richard-Plouet

doi:10.1016/j.apsusc.2019.145056

Unravelling local environments in mixed TiO2–SiO2 thin films by XPS and ab initio calculations

Pavel Ondračka, David Necas, Michèle Carette, Stephane Elisabeth, David Holec, Agnès Granier, Antoine Goullet, Lenka Zajickkova, Mireille Richard-Plouet

Lehrstuhl für Metallkunde (420)

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Begutachtung

9 Zitate (Scopus)

Originalsprache	Englisch
Seiten (von - bis)	1-11
Fachzeitschrift	Applied surface science
Jahrgang	2020
Ausgabenummer	510
DOIs	https://doi.org/10.1016/j.apsusc.2019.145056
Publikationsstatus	Veröffentlicht - 2020

Zugriff auf Dokument

10.1016/j.apsusc.2019.145056

Dieses zitieren

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author = "Pavel Ondra{\v c}ka and David Necas and Mich{\`e}le Carette and Stephane Elisabeth and David Holec and Agn{\`e}s Granier and Antoine Goullet and Lenka Zajickkova and Mireille Richard-Plouet",

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AU - Ondračka, Pavel

AU - Necas, David

AU - Carette, Michèle

AU - Elisabeth, Stephane

AU - Holec, David

AU - Granier, Agnès

AU - Goullet, Antoine

AU - Zajickkova, Lenka

AU - Richard-Plouet, Mireille

PY - 2020

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DO - 10.1016/j.apsusc.2019.145056

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JO - Applied surface science

JF - Applied surface science

IS - 510

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