Structure, stress, and mechanical properties of Mo-Al-N thin films deposited by dc reactive magnetron cosputtering: Role of point defects

Firat Angay, Lukas Löfler, Florent Tetard, Dominique Eyidi, Philippe Djemia, David Holec, Gregory Abadias

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Begutachtung

3 Zitate (Scopus)

Originalsprache	Englisch
Seiten (von - bis)	1-14
Fachzeitschrift	Journal of vacuum science & technology / A (JVST)
Jahrgang	2020
DOIs	https://doi.org/10.1116/6.0000292
Publikationsstatus	Veröffentlicht - 2020

Zugriff auf Dokument

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T1 - Structure, stress, and mechanical properties of Mo-Al-N thin films deposited by dc reactive magnetron cosputtering: Role of point defects

AU - Angay, Firat

AU - Löfler, Lukas

AU - Tetard, Florent

AU - Eyidi, Dominique

AU - Djemia, Philippe

AU - Holec, David

AU - Abadias, Gregory

PY - 2020

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