Photolithographic patterning of polymer surfaces based on the photo-Fries rearrangement: selective post-exposure reactions

Thomas Grießer, Thomas Höfler, Susanne Temmel, Wolfgang Kern, Gregor Trimmel

Publikation: Konferenzbeitrag › Poster › Forschung › Begutachtung

Titel in Übersetzung	Photolithographic patterning of polymer surfaces based on the photo-Fries rearrangement: selective post-exposure reactions
Originalsprache	Deutsch
Publikationsstatus	Veröffentlicht - 2007
Veranstaltung	Winterschool on “Interface Controlled and Functionalised Organic Films” - Planneralm, Irdning, Österreich Dauer: 27 Jan. 2007 → …

Konferenz	Winterschool on “Interface Controlled and Functionalised Organic Films”
Land/Gebiet	Österreich
Ort	Irdning
Zeitraum	27/01/07 → …

Dieses zitieren

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title = "Photolithographic patterning of polymer surfaces based on the photo-Fries rearrangement: selective post-exposure reactions",

author = "Thomas Grie{\ss}er and Thomas H{\"o}fler and Susanne Temmel and Wolfgang Kern and Gregor Trimmel",

year = "2007",

language = "Deutsch",

note = "Winterschool on “Interface Controlled and Functionalised Organic Films” ; Conference date: 27-01-2007",

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Photolithographic patterning of polymer surfaces based on the photo-Fries rearrangement: selective post-exposure reactions. / Grießer, Thomas; Höfler, Thomas; Temmel, Susanne et al.
2007. Postersitzung präsentiert bei Winterschool on “Interface Controlled and Functionalised Organic Films”, Irdning, Österreich.

Publikation: Konferenzbeitrag › Poster › Forschung › Begutachtung

TY - CONF

T1 - Photolithographic patterning of polymer surfaces based on the photo-Fries rearrangement: selective post-exposure reactions

AU - Grießer, Thomas

AU - Höfler, Thomas

AU - Temmel, Susanne

AU - Kern, Wolfgang

AU - Trimmel, Gregor

PY - 2007

Y1 - 2007

M3 - Poster

T2 - Winterschool on “Interface Controlled and Functionalised Organic Films”

Y2 - 27 January 2007

ER -