New photosensitive silane molecule for photochemical patterning of thin layers

Alexandra Lex; Peter Pacher; Robert Schennach; Quan Shen; Gregor Hlawacek; Christian Teichert; Oliver Werzer; Roland Resel; Egbert Zojer; Wolfgang Kern; Georg Trimmel

New photosensitive silane molecule for photochemical patterning of thin layers

Titel in Übersetzung: New photosensitive silane molecule for photochemical patterning of thin layers

Alexandra Lex, Peter Pacher, Robert Schennach, Quan Shen, Gregor Hlawacek, Christian Teichert, Oliver Werzer, Roland Resel, Egbert Zojer, Wolfgang Kern, Georg Trimmel

Lehrstuhl für Chemie der Kunststoffe (231)

Publikation: Konferenzbeitrag › Poster › Forschung › Begutachtung

Titel in Übersetzung	New photosensitive silane molecule for photochemical patterning of thin layers
Originalsprache	Englisch
Publikationsstatus	Veröffentlicht - 2007
Veranstaltung	NFN Winter School on Organic Electronics 2008 Planneralm - Planneralm, Donnersbach, Österreich Dauer: 26 Jan. 2008 → 31 Jan. 2008

Konferenz

Konferenz	NFN Winter School on Organic Electronics 2008 Planneralm
Land/Gebiet	Österreich
Ort	Donnersbach
Zeitraum	26/01/08 → 31/01/08

Dieses zitieren

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title = "New photosensitive silane molecule for photochemical patterning of thin layers",

author = "Alexandra Lex and Peter Pacher and Robert Schennach and Quan Shen and Gregor Hlawacek and Christian Teichert and Oliver Werzer and Roland Resel and Egbert Zojer and Wolfgang Kern and Georg Trimmel",

year = "2007",

language = "English",

note = "NFN Winter School on Organic Electronics 2008 Planneralm ; Conference date: 26-01-2008 Through 31-01-2008",

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TY - CONF

T1 - New photosensitive silane molecule for photochemical patterning of thin layers

AU - Lex, Alexandra

AU - Pacher, Peter

AU - Schennach, Robert

AU - Shen, Quan

AU - Hlawacek, Gregor

AU - Teichert, Christian

AU - Werzer, Oliver

AU - Resel, Roland

AU - Zojer, Egbert

AU - Kern, Wolfgang

AU - Trimmel, Georg

PY - 2007

Y1 - 2007

M3 - Poster

T2 - NFN Winter School on Organic Electronics 2008 Planneralm

Y2 - 26 January 2008 through 31 January 2008

ER -