Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy

F. Saghaeian; J. Keckes; S. Woehlert; M. Rosenthal; M. Reisinger; J. Todt

doi:10.1016/j.tsf.2019.137576

Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy

F. Saghaeian, J. Keckes, S. Woehlert, M. Rosenthal, M. Reisinger, J. Todt

Montanuniversität

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Begutachtung

3 Zitate (Scopus)

Originalsprache	Englisch
Aufsatznummer	137576
Fachzeitschrift	Thin solid films
Jahrgang	691
DOIs	https://doi.org/10.1016/j.tsf.2019.137576
Publikationsstatus	Veröffentlicht - 1 Dez. 2019

Zugriff auf Dokument

10.1016/j.tsf.2019.137576

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@article{73e2be12f03c4419ad6c7819ec3add18,

title = "Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy",

keywords = "Internal stress, Residual stress, Thin film, Titanium tungsten, Diffusion barrier, X-ray nanodiffraction",

author = "F. Saghaeian and J. Keckes and S. Woehlert and M. Rosenthal and M. Reisinger and J. Todt",

year = "2019",

month = dec,

day = "1",

doi = "10.1016/j.tsf.2019.137576",

language = "English",

volume = "691",

journal = "Thin solid films",

issn = "0040-6090",

publisher = "Elsevier",

}

TY - JOUR

T1 - Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy

AU - Saghaeian, F.

AU - Keckes, J.

AU - Woehlert, S.

AU - Rosenthal, M.

AU - Reisinger, M.

AU - Todt, J.

PY - 2019/12/1

Y1 - 2019/12/1

KW - Internal stress

KW - Residual stress

KW - Thin film

KW - Titanium tungsten, Diffusion barrier

KW - X-ray nanodiffraction

UR - http://www.scopus.com/inward/record.url?scp=85073521309&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2019.137576

DO - 10.1016/j.tsf.2019.137576

M3 - Article

AN - SCOPUS:85073521309

SN - 0040-6090

VL - 691

JO - Thin solid films

JF - Thin solid films

M1 - 137576

ER -